Picosun precursor sources for ALD mass production

Picosun Oy, a supplier of industrial scale Atomic Layer Deposition (ALD) thin film coating solutions, with headquarters in Detroid, Michigan, has introduced a new range of precursor sources especially designed for high volume manufacturing.
The new Picohot(TM) 400 source system is the latest addition to Picosun’s line of production-compatible high temperature sources. The Picohot(TM) 400 source system’s ALD valves can be heated up to over 400oC to enable efficient delivery of both solid and liquid very low volatility chemicals in large doses, optimal for batch processing. The source is especially suitable for metal chloride precursors, ensuring particle-free processing of hafnium oxide and many other materials, up to 300 mm wafers. The large internal volume of the source container guarantees long, continuous process uptime with effective precursor utilization and minimized number of service breaks. A separate, production-compatible purge valve speeds up the maintenance procedures even further.
“As the number of industrial ALD applications keeps booming there is a growing need to widen the selection of precursor chemicals. Precursors for several important production processes only exist as solids or low volatility liquids. Our leading experience in ALD system design now enables the first, true production-scale high temperature source systems designed solely based on the requirements of the ALD method and fulfilling the strictest quality standards of the semiconductor industries. We are pleased to provide our customers with these systems to make their most advanced novel products come true in high manufacturing volumes,” states Mr. Juhana Kostamo, Managing Director of Picosun.

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